铝酸钇

Can be used as a sputtering target to prepare bubble memory devices.Yttrium aluminum oxide finds application in ceramic, glass and optics due to its thermal stability and insolubility. It is used in the preparation of sputtering bonded targets in chemical processes viz. chemical vapor deposition, atomic thermal and electron beam evaporation. It is also used in solar, water treatment and fuel cell. Further, it is used as coloring and adhesive agents in enamels manufacture.

Incompatible with strong oxidizing agents, halogenated hydrocarbon, strong bases, strong acids, vinyl compounds, ethylene oxide, chlorine trifluoride, oxygen difluoride and sodium nitrate.

MFCD00213958

234-465-8

Y₃Al₅O₁₂

593.62

1760°

4.65

1.833

Ambient temperatures.

3-12mm Fused Lump

Insoluble in water.

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