碳溅射靶

Used as Magnetron sputtering source. The carbon sputtering target was replaced after the de- positions of 20-30 films with several thousand A in thick- ness in mass-separated negative-ion-beam deposition system. Carbon films can also be deposited by magnetron sputtering in which a magnetically confined plasma torus (?“race track?”) acts as a distributed source of ions that impact a carbon sputtering target over a significant part of its area. C -ions were produced from a highly pure carbon-sputtering target by cesium ion sputtering in a neutral and ionized alkaline bombardment-type heavy negative ion source. CN negative ions of 0.88 mA were safely obtained by using a carbon sputtering target and nitrogen gas instead of cyanogen for ionization.

Thickness tolerance: ^+0.015in; Diameter tolerance: ^+0.020in

MFCD00133992

231-955-3

Ambient temperatures.

Hot Pressed

Insoluble in water.

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